Related Experiment Video
Updated: Jun 29, 2026

Ohmic Contact Fabrication Using a Focused-ion Beam Technique and Electrical Characterization for Layer Semiconductor Nanostructures
Published on: December 5, 2015
Structural Aspects of MoS Prepared by Atomic Layer Deposition for Hydrogen Evolution Reaction
Miika Mattinen1, Wei Chen2, Rebecca A Dawley3
1Department of Applied Physics and Science Education, Eindhoven University of Technology, P.O. Box 513, 5600 MB Eindhoven, The Netherlands.
Abstract:
Molybdenum sulfides (MoS ) in both crystalline and amorphous forms are promising earth-abundant electrocatalysts for hydrogen evolution reaction (HER) in acid. Plasma-enhanced atomic layer deposition was used to prepare thin films of both amorphous MoS with adjustable S/Mo ratio (2.8-4.7) and crystalline MoS2 with tailored crystallinity, morphology, and electrical properties. All the amorphous MoS films transform into highly HER-active amorphous MoS2 (overpotential 210-250 mV at 10 mA/cm2 in 0.5 M H2SO4) after electrochemical activation at approximately -0.3 V vs reversible hydrogen electrode. However, the initial film stoichiometry affects the structure and consequently the HER activity and stability. The material changes occurring during activation are studied using ex situ and quasi in situ X-ray photoelectron spectroscopy. Possible structures of as-deposited and activated catalysts are proposed. In contrast to amorphous MoS , no changes in the structure of crystalline MoS2 catalysts are observed. The overpotentials of the crystalline films range from 300 to 520 mV at 10 mA/cm2, being the lowest for the most defective catalysts. This work provides a practical method for deposition of tailored MoS HER electrocatalysts as well as new insights into their activity and structure.
More Related Videos
10:41Preparation of Liquid-exfoliated Transition Metal Dichalcogenide Nanosheets with Controlled Size and Thickness: A State of the Art Protocol
Published on: December 20, 2016
08:50Preparation of Large-area Vertical 2D Crystal Hetero-structures Through the Sulfurization of Transition Metal Films for Device Fabrication
Published on: November 28, 2017
Related Concept Videos
MO Theory and Covalent Bonding
MOSFET
In an n-MOSFET, the structure includes n-type source and drain...
Characteristics of MOSFET
Various vital parameters influence their functionality, which is crucial for theory and electronics applications. First, channel dimensions, precisely length, and width, are pivotal. The size of these channels affects the transistor's ability to carry current and switching speeds; shorter channels typically enable quicker...
MOS Capacitor
The metal gate is typically made from highly conductive materials such as aluminum or polysilicon. Beneath the metal gate lies a thin layer of...
MOSFET: Enhancement Mode
In their basic form, enhancement-mode MOSFETs are typically non-conductive when the gate-source voltage (Vgs) is zero. This default 'off' state means no current...
MOSFET: Depletion Mode
The primary characteristic of depletion-mode MOSFETs is their ability to conduct current between the drain and source terminals without gate bias. This inherent conductivity arises...