Schottky Barrier Diode
Metal-Semiconductor Junctions
P-N junction
Biasing of P-N Junction
Field Effect Transistor
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Updated: Jun 21, 2025

Fabrication of Schottky Diodes on Zn-polar BeMgZnO/ZnO Heterostructure Grown by Plasma-assisted Molecular Beam Epitaxy
Published on: October 23, 2018
Carsten Strobel1, Carlos Alvarado Chavarin2, Martin Knaut1
1Institute of Semiconductors and Microsystems, Chair of Nanoelectronics, Technische Universität Dresden, Nöthnitzer Straße 64, 01187 Dresden, Germany.
Researchers demonstrated a p-type Schottky contact between graphene and germanium for adjustable-barrier phototransistors. This advance enables dual-band photodetection, crucial for high-speed infrared and visible light applications.
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