High Volatile Antimony(III) Precursors for Metal Oxide Thin Film Deposition

Ji-Seoung Jeong1,2, Sunyoung Shin1, Bo Keun Park1,3

  • 1Thin Film Materials Research Center, Korea Research Institute of Chemical Technology, Daejeon 34114, Republic of Korea.

ACS Omega
|July 29, 2024
PubMed