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Effective concentration ratio driven phase engineering of MBE-grown few-layer MoTe2
Kamlesh Bhatt1, Santanu Kandar1, Nand Kumar2
1Department of Physics, Indian Institute of Technology Delhi, Hauz Khas, New Delhi 110016, India. rsingh@physics.iitd.ac.in.
Controlling the phase of few-layer molybdenum ditelluride (MoTe2) is key for advanced electronics. Growth parameters like temperature and flux ratio determine the material
Area of Science:
- Materials Science
- Condensed Matter Physics
- Nanotechnology
Background:
- Ultrathin transition metal dichalcogenides (TMDCs) exhibit polymorphism, making phase engineering critical.
- Controlling phase in TMDCs is essential for tailored electronic and optoelectronic properties.
Purpose of the Study:
- To investigate the effect of growth parameters on phase engineering of few-layer MoTe2.
- To understand the mechanisms governing phase selectivity in MoTe2 growth.
Main Methods:
- Molecular beam epitaxy (MBE) for few-layer MoTe2 growth on sapphire.
- X-ray Photoelectron Spectroscopy (XPS) and Kelvin Probe Force Microscopy (KPFM) for characterization.
Main Results:
- The 2H phase of MoTe2 is stabilized within a specific range of flux ratio and growth temperature.
- The 1T' phase is favored outside this optimal regime.
- Effective Te/Mo concentration ratio at the growth surface dictates phase selectivity.
- Excess carrier doping contributes to phase transitions.
Conclusions:
- Growth parameter control enables versatile and precise phase engineering of few-layer MoTe2.
- This facilitates the fabrication of large-scale heterostructures for electronic and optoelectronic devices.
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