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Published on: October 23, 2018
Realization of Extremely High-Gain and Low-Power in nMOS Inverter Based on Monolayer WS2 Transistor Operating in
Eunyeong Yang1, Sekwon Hong1, Jiwon Ma1
1Department of Materials Science and Engineering, Yonsei University, Seoul 03722, South Korea.
We developed high-gain, low-power n-type metal-oxide-semiconductor (nMOS) inverters using chemical vapor deposition (CVD)-grown monolayer tungsten disulfide (WS₂) field-effect transistors (FETs). These WS₂ nMOS inverters achieve significant gains and demonstrate potential for advanced logic circuits.
Area of Science:
- Materials Science
- Nanotechnology
- Semiconductor Physics
Background:
- Monolayer transition metal dichalcogenides (TMDs) like WS₂ are promising for next-generation electronics.
- Achieving high-performance n-type field-effect transistors (FETs) in TMDs remains a challenge.
- Large-area synthesis of high-quality TMD materials is crucial for practical applications.
Purpose of the Study:
- To fabricate and characterize n-type metal-oxide-semiconductor (nMOS) inverters using chemical vapor deposition (CVD)-grown monolayer WS₂ FETs.
- To investigate the electrical properties and gain performance of these WS₂ nMOS inverters.
- To explore the potential of monolayer WS₂ for low-power, high-gain logic circuits and integrated systems.
Main Methods:
- Large-area monolayer WS₂ films were synthesized using chemical vapor deposition (CVD).
- n-type doping was achieved using AlOₓ/Al₂O₃, and a double-gate structure with high-κ HfO₂ dielectric was employed.
- Fabrication and electrical characterization of WS₂ FETs and nMOS inverters were performed.
Main Results:
- CVD-grown monolayer WS₂ FETs exhibited excellent electrical properties, including high on/off ratios and small subthreshold swings.
- Subthreshold operating WS₂ nMOS inverters achieved exceptionally high intrinsic gains (564 at 1 V, 2056 at 2 V) and low power consumption (∼2.3 pW·μm⁻¹ at 1 V).
- Demonstrated logic circuits included AND, OR, NAND, NOR gates, and static random-access memory (SRAM), showcasing WS₂'s circuit integration capabilities.
Conclusions:
- Monolayer WS₂ FETs, when properly doped and structured, can form high-gain, low-power nMOS inverters.
- The superior subthreshold characteristics of WS₂ FETs enable significantly higher intrinsic gain than conventional silicon MOSFETs.
- These results highlight the potential of large-area CVD-grown monolayer WS₂ for practical, high-performance logic circuits and integrated systems.
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