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Study on Data Preprocessing for Machine Learning Based on Semiconductor Manufacturing Processes.

Ha-Je Park1, Yun-Su Koo2, Hee-Yeong Yang1

  • 1Department of Software Convergence Engineering, Inha University, 100 Inha-ro, Michuhol-gu, Incheon 22212, Republic of Korea.

Sensors (Basel, Switzerland)
|September 14, 2024
PubMed
Summary
This summary is machine-generated.

This study optimizes semiconductor manufacturing by using machine learning to predict product defects. The best model combined Support Vector Machines (SVM) with ADASYN oversampling and MaxAbs scaling for improved yield and reduced costs.

Keywords:
SECOM datasetgeometric meanmachine learningoversamplingsemiconductor manufacturing process

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Area of Science:

  • Semiconductor Manufacturing
  • Machine Learning
  • Data Science

Background:

  • Semiconductor manufacturing generates diverse, imbalanced data from various sensors.
  • Data preprocessing is crucial for accurate yield prediction and cost reduction.
  • Existing methods often struggle with imbalanced datasets and lengthy processing times.

Purpose of the Study:

  • To evaluate machine learning analysis and preprocessing techniques for predicting semiconductor product quality.
  • To enhance product yield and decrease manufacturing costs through improved defect prediction.
  • To address data challenges like diverse units, imbalanced classes, and high dimensionality.

Main Methods:

  • Utilized the SECOM dataset for analysis.
  • Applied preprocessing techniques: missing value imputation, dimensionality reduction, resampling (oversampling/undersampling), and feature scaling.
  • Implemented and compared six machine learning models, focusing on geometric mean (GM) for evaluation.
  • Ensured data integrity by preventing data leakage through early train/test set separation.

Main Results:

  • Oversampling methods, excluding KM SMOTE, effectively balanced the dataset classes.
  • The combination of Support Vector Machines (SVM), Adaptive Synthetic Sampling (ADASYN), and MaxAbs scaling achieved the highest performance.
  • The optimal model yielded an accuracy of 85.14% and a geometric mean (GM) of 72.95%.

Conclusions:

  • The proposed preprocessing and machine learning approach significantly improves defect prediction in semiconductor manufacturing.
  • Feature reduction techniques shorten training and prediction times, enhancing practical applicability.
  • The study demonstrates the effectiveness of SVM with ADASYN and MaxAbs scaling for imbalanced semiconductor data.