Ultra-shallow p-type doping of silicon by performing atomic layer deposition of Al2O3 thin films onto SiO2/Si

Salma Khaldi1, Prajith Karadan1, Krushnamurty Killi1

  • 1Institute of Chemistry and the Center for Nanoscience and Nanotechnology, The Hebrew University of Jerusalem, Givat Ram Jerusalem 91904, Israel. roie.yerushalmi@mail.huji.ac.il.

Chemical Communications (Cambridge, England)
|September 25, 2024
PubMed