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Microscopic Origin of Polarity-Dependent VTH Shift in Amorphous Chalcogenides for 3D Self-Selecting Memory
Ha-Jun Sung1, Minwoo Choi1, Zhe Wu2
1Thin Film Technical Unit, Samsung Advanced Institute of Technology, Samsung Electronics, Suwon-si, 16677, South Korea.
Advanced Science (Weinheim, Baden-Wurttemberg, Germany)
|October 9, 2024
Summary
Ovonic threshold switching selectors enable revolutionary 3D memory. This study reveals polarity-dependent threshold voltage shifts are driven by charged defect dynamics, crucial for optimizing selector-only memory.
Area of Science:
- Materials Science
- Solid-State Electronics
- Non-volatile Memory
Background:
- Ovonic threshold switching (OTS) selectors are key to 3D memory technologies due to their self-selecting memory (SSM) behavior.
- Optimization of OTS device composition and operation is hindered by a complex understanding of the memory writing mechanism.
Purpose of the Study:
- To investigate the mechanism behind the polarity-dependent threshold voltage shift (ΔVTH) in OTS selectors.
- To elucidate the role of charged defects and electric fields in the memory writing operation.
Main Methods:
- Theoretical analysis of threshold switching principles.
- Experimental investigation including defect state analysis.
- Examination of the influence of non-uniform electric fields.
Main Results:
- Confirmed that the memory window (ΔVTH) arises from the dynamics of charged defects near electrodes.
- Demonstrated the impact of the non-uniform electric field post-threshold switching on defect distribution.
- Established a link between defect dynamics and polarity-dependent voltage shifts.
Conclusions:
- Provides critical insights into the operational mechanism of OTS-based SSM (selector-only memory).
- Highlights the potential of OTS selectors for high-density, low-cost, and energy-efficient memory solutions.
- Supports advancements in memory technologies for artificial intelligence applications.

