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Updated: Jul 6, 2026

A Standard and Reliable Method to Fabricate Two-Dimensional Nanoelectronics
Published on: August 28, 2018
A Thorough Review of Emerging Technologies in Micro- and Nanochannel Fabrication: Limitations, Applications, and
Koosha Karimi1, Ali Fardoost1, Nikhil Mhatre1
1Department of Electrical and Computer Engineering, Rutgers University, Piscataway, NJ 08854, USA.
Abstract:
In recent years, the field of micro- and nanochannel fabrication has seen significant advancements driven by the need for precision in biomedical, environmental, and industrial applications. This review provides a comprehensive analysis of emerging fabrication technologies, including photolithography, soft lithography, 3D printing, electron-beam lithography (EBL), wet/dry etching, injection molding, focused ion beam (FIB) milling, laser micromachining, and micro-milling. Each of these methods offers unique advantages in terms of scalability, precision, and cost-effectiveness, enabling the creation of highly customized micro- and nanochannel structures. Challenges related to scalability, resolution, and the high cost of traditional techniques are addressed through innovations such as deep reactive ion etching (DRIE) and multipass micro-milling. This paper also explores the application potential of these technologies in areas such as lab-on-a-chip devices, biomedical diagnostics, and energy-efficient cooling systems. With continued research and technological refinement, these methods are poised to significantly impact the future of microfluidic and nanofluidic systems.
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