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Updated: Jul 11, 2026

Fabrication of Silica Ultra High Quality Factor Microresonators
Published on: July 2, 2012
Band edge modulation for high-performance LL-SAW resonators on LiNbO3/SiC by introducing an ultra-thin intermediate
Juxing He1, Shibin Zhang1, Pengcheng Zheng1
1State Key Laboratory of Materials for Integrated Circuits,Shanghai Institute of Microsystem and Information Technology, Shanghai 200050, China; Center of Materials Science and Optoelectronics Engineering, University of Chinese Academy of Science, Beijing 100190, China.
Abstract:
With the exploding demand of rapid information transmission, high-frequency acoustic filtering devices are becoming an immediate need. Longitudinal leaky surface acoustic wave (LL-SAW) devices with unique advantages can be a promising platform. In this paper, we introduce a 100 nm intermediate oxide layer into the X-cut lithium niobate on silicon carbide (LiNbO3/SiC) to improve the in-band performance of LL-SAW resonators. First, the dispersion curves of the structures are analyzed by finite element method. In this part, we successfully interpret the intrinsic low quality factor (Q) of LL-SAW on LiNbO3/SiC in general design, and predict the enhancement of Q by introducing an intermediate oxide layer without degradation on spurious response. Then, one port resonators considered in the simulation are fabricated and measured. As a result, enhancements in Bode Q among the whole passband are confirmed. Compared with devices state of art, resonators with leading performances are demonstrated. The fabricated resonators have peak-valley admittance ratio of 63.87 dB, Bode Q of ∼300 at fr and ∼530 at far, keff2of 15.66 % and phase velocity of 6187.3 m/s. Additionally, the resonant frequency of SH1 mode shifts to higher frequency. This work enables the design of next generation high frequency mobile communication filters.
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