Ballistic transport in sub-10 nm monolayer InAs transistors for high-performance applications

As an outstanding two-dimensional (2D) semiconductor among III-V compounds, InAs has attracted significant attention due to its much higher electron mobility than silicon and potential for enhanced opportunities in the field of electronic and optical devices. Recently, 2D semiconducting InAs with a thickness of 4.8 nm has been successfully prepared. Here, we systematically investigated the ballistic transport characteristics of sub-10 nm monolayer InAs (InAsH₂) metal-oxide-semiconductor field-effect transistors (MOSFETs) by using ab initio quantum transport simulation, which includes on-state current, subthreshold swing, intrinsic delay time, and power consumption. The results suggest that the monolayer (ML) InAsH₂ MOSFETs exhibit excellent performance with a beneficial doping concentration and underlap, which can meet the high-performance requirements of the International Technology Roadmap for Semiconductors (ITRS) for the 2013 version until the length of the gate is decreased to 4.0 nm. Moreover, we studied the influence of high-k dielectric effects. We found that both the on-state current and subthreshold swing with a 5.0 nm-gate-length are apparently improved. This work indicates that ML InAsH₂ is a suitable nominee for the upcoming generation of channel materials.