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Breaking the Boltzmann limit in sub-5 nm monolayer CdPS3 transistors
Manzhou Wang1, Yuliang Mao1,2
1School of Physics and Optoelectronics, Xiangtan University, Hunan, 411105, China. ylmao@xtu.edu.cn.
Physical Chemistry Chemical Physics : PCCP
|May 1, 2026
Summary
Monolayer CdPS3 shows promise for next-generation electronics. This material enables tunnel field-effect transistors (TFETs) with ultrasteep subthreshold swing, surpassing conventional limits for high-performance nanoelectronics.
Area of Science:
- Materials Science
- Condensed Matter Physics
- Nanoelectronics
Background:
- Conventional metal-oxide-semiconductor field-effect transistors (MOSFETs) are limited by the 60 mV dec-1 Boltzmann limit.
- Tunnel field-effect transistors (TFETs) offer a potential solution to overcome this fundamental limitation.
- Advanced semiconductor materials are crucial for developing next-generation logic devices.
Purpose of the Study:
- Investigate the potential of monolayer CdPS3 (ML CdPS3) for sub-5 nm logic devices.
- Examine the anisotropic quantum transport properties of ML CdPS3.
- Determine the suitability of ML CdPS3 for high-performance nanoelectronics.
Main Methods:
- Utilized first-principle quantum transport simulations.
- Analyzed the electronic and transport properties of ML CdPS3.
- Simulated device performance for MOSFETs with varying gate lengths.
Main Results:
- ML CdPS3 MOSFETs oriented along the zigzag direction demonstrate tunneling-dominated transport.
- Achieved an ultrasteep minimum subthreshold swing (SS) of 37.8 mV dec-1.
- Devices with a 3 nm gate length meet International Roadmap for Devices and Systems (IRDS) high-performance standards.
Conclusions:
- ML CdPS3 exhibits excellent potential for sub-5 nm logic devices.
- The anisotropic properties of ML CdPS3 are key to its superior performance.
- ML CdPS3 is a strong candidate for next-generation high-performance nanoelectronics.
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