Theoretical analysis of nanoscale local etching of a rough quartz surface under direct illumination

A 3D model of photochemical polishing of rough quartz surfaces under direct illumination has been developed. One of the features of the model is its ability to predict the results of a photochemical polishing process without the need for time-consuming calculations. The proposed model analyzes the characteristics of the surface evolution during polishing based on the initial roughness parameters and the polarization of the incident radiation. When a rough surface is irradiated with linearly polarized light, a textured surface in the form of furrows is produced. Non-polarized radiation is recommended to obtain a flatter surface.