A general optimization framework for nanofabrication using shadow sphere Lithography: A case study on chiral nanohole

Xinyi Chen1, Mingyu Cheng1, Jinglan Zhang1

  • 1School of Microelectronics and Communication Engineering, Chongqing Key Laboratory of Bio-perception & Intelligent Information Processing, Chongqing University, Chongqing 401331, PR China.

Summary

This study introduces an optimization framework for shadow sphere lithography (SSL) nanostructures, enhancing chiral metamaterial design. The method significantly reduces computational costs and accelerates the discovery of advanced nanophotonic devices.

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