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Updated: Jun 7, 2025

The Effect of Anodization Parameters on the Aluminum Oxide Dielectric Layer of Thin-Film Transistors
Published on: May 24, 2020
p-Type Oxide Thin-Film Transistor with Unprecedented Hole Field-Effect Mobility for an All-Oxide CMOS CFET-like
Jiqing Lu1,2, Mei Shen3, Xuewei Feng4
1Harbin Institute of Technology, Harbin 150001, China.
Abstract:
The lack of low temperature processable, high-performance p-type oxide thin-film transistors (TFTs) limits their implementation in monolithically integrated back-end-of-line (BEOL) CMOS circuitries. In this work, we demonstrate a reactive magnetron-sputtered SnO TFT with unprecedented hole field-effect mobility (μ) of 38.7 cm2/V·s, as well as an on/off current ratio (I) of 2.5 × 103 and lower subthreshold swing (SS) of 240.9 mV/dec when compared to reported works on p-type oxide-based TFTs. Material characterization correlated with the SnO TFTs' electrical behavior elucidated the performance to the structural and compositional phase modulation of the SnO thin films, modulated by O2 partial pressure during deposition and post-encapsulation annealing. By integrating the SnO TFT with an IGZO TFT in both planar and stacked complementary FET-like form, we demonstrated a true oxide-based CMOS inverter, achieving one of the highest voltage gains of 57 and the lowest static power consumption down to 34 pW for both on and off states.
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