Jove
Visualize
Contact Us
JoVE
x logofacebook logolinkedin logoyoutube logo
ABOUT JoVE
OverviewLeadershipBlogJoVE Help Center
AUTHORS
Publishing ProcessEditorial BoardScope & PoliciesPeer ReviewFAQSubmit
LIBRARIANS
TestimonialsSubscriptionsAccessResourcesLibrary Advisory BoardFAQ
RESEARCH
JoVE JournalMethods CollectionsJoVE Encyclopedia of ExperimentsArchive
EDUCATION
JoVE CoreJoVE BusinessJoVE Science EducationJoVE Lab ManualFaculty Resource CenterFaculty Site
Terms & Conditions of Use
Privacy Policy
Policies

Related Concept Videos

You might also read

Related Articles

Articles linked to this work by shared authors, journal, and citation graph.

Sort by
Same author

Interferometric spectroscopy and high-speed orientation detection of individual gold nanorods.

Nanoscale·2020
Same author

Multi-photon patterning of photoactive o-nitrobenzyl ligands bound to gold surfaces.

Photochemical & photobiological sciences : Official journal of the European Photochemistry Association and the European Society for Photobiology·2018
Same author

Light-Directed Patchy Particle Fabrication and Assembly from Isotropic Silver Nanoparticles.

Langmuir : the ACS journal of surfaces and colloids·2017
See all related articles

Related Experiment Video

Updated: Jun 7, 2025

Micropunching Lithography for Generating Micro- and Submicron-patterns on Polymer Substrates
09:24

Micropunching Lithography for Generating Micro- and Submicron-patterns on Polymer Substrates

Published on: July 2, 2012

15.2K

Microscale Metal Patterning on Any Substrate: Exploring the Potential of Poly(dopamine) Films in High Resolution,

Elliott D Kunkel1, C Blake Loker1, Hunter N Cowden1

  • 1Department of Physics, Virginia Tech, Blacksburg, Virginia 24060, United States.

ACS Applied Materials & Interfaces
|November 20, 2024
PubMed
Summary

Poly(dopamine) (PDA) and related films show promise as photoresists for high-resolution patterning. Modified films significantly reduce silver deposition off-pattern, enabling high-contrast lithography on diverse materials.

Keywords:
catecholaminesconformal coatingslithographymetallizationphotocatalysisphotoreductionpolydopaminethin films

More Related Videos

Fabricating Reactive Surfaces with Brush-like and Crosslinked Films of Azlactone-Functionalized Block Co-Polymers
10:09

Fabricating Reactive Surfaces with Brush-like and Crosslinked Films of Azlactone-Functionalized Block Co-Polymers

Published on: June 30, 2018

8.2K
A Versatile Method of Patterning Proteins and Cells
09:57

A Versatile Method of Patterning Proteins and Cells

Published on: February 26, 2017

9.3K

Related Experiment Videos

Last Updated: Jun 7, 2025

Micropunching Lithography for Generating Micro- and Submicron-patterns on Polymer Substrates
09:24

Micropunching Lithography for Generating Micro- and Submicron-patterns on Polymer Substrates

Published on: July 2, 2012

15.2K
Fabricating Reactive Surfaces with Brush-like and Crosslinked Films of Azlactone-Functionalized Block Co-Polymers
10:09

Fabricating Reactive Surfaces with Brush-like and Crosslinked Films of Azlactone-Functionalized Block Co-Polymers

Published on: June 30, 2018

8.2K
A Versatile Method of Patterning Proteins and Cells
09:57

A Versatile Method of Patterning Proteins and Cells

Published on: February 26, 2017

9.3K

Area of Science:

  • Materials Science
  • Nanotechnology
  • Surface Chemistry

Background:

  • Standard photoresists face limitations on nonplanar, soft, and biological materials.
  • Poly(dopamine) (PDA) offers photosensitivity, biocompatibility, and conformal coating properties.
  • Exploring alternative deposition and film chemistries is crucial for advanced lithography.

Purpose of the Study:

  • To evaluate poly(dopamine) (PDA) and poly(norepinephrine) (PNE) films as conformal photoresists.
  • To investigate the effect of standard vs. fast oxidation (FO) deposition on lithographic performance.
  • To optimize silver ion photoreduction for high-resolution micropatterning.

Main Methods:

  • Deposition of PDA and PNE films using autoxidation and fast oxidation techniques.
  • Photocatalytic reduction of silver ions using blue (473 nm) and UV-A (375 nm) light.
  • Laser-scanning lithography to pattern films and analyze spatial resolution.
  • Scanning Electron Microscopy (SEM) to characterize silver grain size and film morphology.

Main Results:

  • Fast-oxidation PDA (FO-PDA) and PNE films exhibit suppressed nonspecific silver deposition, enabling high-contrast lithography.
  • PNE and FO-PDA films show smaller silver grain sizes (<40 nm) compared to standard PDA films (up to 200 nm).
  • Achieved 1.7 μm spatial resolution, near the experimental optical limit, with continuous silver films forming at specific optical doses.

Conclusions:

  • PDA and its derivatives are viable conformal photoresists for challenging substrates.
  • Film chemistry modification (e.g., FO-PDA, PNE) significantly enhances lithographic contrast and resolution.
  • These materials offer a promising platform for micro- and nanofabrication on diverse surfaces.