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Related Concept Videos

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Multi-plane light conversion (MPLC) LP mode multiplexer based on grayscale maskless lithography.

Xueli Chen, Xiaoyu Yan, Juncheng Fang

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    Summary
    This summary is machine-generated.

    Maskless grayscale lithography enables precise fabrication of multi-plane light conversion (MPLC) devices for mode-division multiplexing (MDM) communications. This single-exposure technique reduces errors, achieving low insertion loss and mode crosstalk for high-speed optical signals.

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    Area of Science:

    • Optical communications
    • Nanofabrication

    Background:

    • Multi-plane light conversion (MPLC) is a flexible technique for mode-division multiplexing (MDM) communications.
    • Conventional MPLC fabrication involves multi-etching processes, leading to accumulated alignment errors and reduced accuracy.
    • Precise fabrication is crucial for MPLC devices to minimize insertion loss and mode crosstalk.

    Purpose of the Study:

    • To propose and demonstrate maskless grayscale lithography for fabricating MPLC devices.
    • To achieve high-accuracy MPLC fabrication with a single-exposure process, avoiding alignment errors.
    • To evaluate the performance of MPLC devices fabricated using this novel technique in MDM systems.

    Main Methods:

    • Employed maskless grayscale lithography for MPLC device fabrication, utilizing a single-exposure process.
    • Discretized the continuous phase (0 to 2π) of the digital mask into 128 steps for MPLC.
    • Experimentally demonstrated mode-division multiplexing (MDM) of LP01, LP11a, LP11b, and LP21 modes using the fabricated MPLC devices.

    Main Results:

    • Achieved mode crosstalk below -22 dB and insertion loss below 4 dB for the fabricated MPLC devices.
    • Successfully transmitted 10 Gbit/s on-off keying (OOK) signals over each LP mode.
    • Demonstrated a power penalty of less than -7 dB in bit error rate (BER) measurements for high-speed optical communications.

    Conclusions:

    • Maskless grayscale lithography is an efficient and accurate method for fabricating MPLC mode multiplexers.
    • The single-exposure technique overcomes limitations of conventional multi-etching processes in MPLC fabrication.
    • The demonstrated MPLC devices are suitable for high-performance mode-division multiplexing in optical communication systems.