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Updated: Jun 5, 2025

Fabrication of Low Temperature Carbon Nanotube Vertical Interconnects Compatible with Semiconductor Technology
Published on: December 7, 2015
Low contact resistance in carbon nanotube devices: metal-induced gap states
Bo Zhang1, Xiaojie Liu1, Huan Wang1,2
1Key Laboratory for Photonic and Electronic Bandgap Materials of Ministry of Education, School of Physics and Electronic Engineering, Harbin Normal University, Harbin, 150025, China. wlyht@126.com.
Abstract:
Designing devices with low contact resistance, especially those based on carbon-based materials, is becoming increasingly important. In this work, we investigated the electronic structure and transport properties of two-types of structures based on carbon nanotubes connecting graphene electrodes by combining density functional theory with the non-equilibrium Green's function method. The directly connected structure exhibits ohmic contact and has a lower contact resistance compared to the typical van der Waals-connected structure. Furthermore, a metal-induced gap state in the directly connected structure provides an extra transport channel, making electron travel easier. The two structures have around a 4-order-of-magnitude difference in conductance at equilibrium and a 5-order-of-magnitude difference in contact resistance at a bias voltage of 0.4 V. This work may offer basic predictions for carbon nanotube transport as well as novel concepts for designing carbon nanotube transistors.
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