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Updated: Jun 5, 2025

In Situ SIMS and IR Spectroscopy of Well-defined Surfaces Prepared by Soft Landing of Mass-selected Ions
Published on: June 16, 2014
Editorial for focus on emerging processes and applications of atomic and molecular layer deposition
Xiangbo Meng1, Jeffrey W Elam2, Sean Barry3
1Department of Mechanical Engineering, University of Arkansas, Fayetteville, AR 72701, United States of America.
Abstract:
This Focus aims to provide a platform for the latest research progress in atomic and molecular layer deposition (ALD and MLD), which collects 10 original research articles and 2 review papers. The original research articles present new precursors, new processes, and new applications. The review papers give a timely summary on the surface chemistry of metal ALD processes and flexible electronics resulting from ALD and MLD, respectively. This ensemble forms a valuable collection that advances our understanding and knowledge of ALD and MLD, and inspires the continued development of these valuable technologies.

