Patterning and nanoribbon formation in graphene by hot punching

Large area graphene patterning is critical for applications. Current graphene patterning techniques, such as electron beam lithography and nano imprint lithography, are time consuming and can scale unfavorably with sample size. Resist-based masking and subsequent dry plasma etching can lead to high roughness edges with no alignment to the underlying graphene crystal orientations. In this study, we present hot punching as a novel and feasible method for patterning of chemical vapor deposition (CVD) graphene sheets supported by a polyvinylalcohol (PVA) layer. Additionally, we observe the effect of such hot punching on graphene supported by PVA via optical microscopy, Raman spectroscopy, AFM, and TEM, including wrinkling, strain and the formation of nanoribbons with crystallographically aligned and smooth edges due to fracturing. We present hot punching as a facile technique for the production of arrays of such nanoribbons.