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Updated: Jun 12, 2026

Determining the Chemical Composition of Corrosion Inhibitor/Metal Interfaces with XPS: Minimizing Post Immersion Oxidation
Published on: March 15, 2017
Operando Characterization of Electrochemistry at the Rutile TiO2(110)/0.1 M HCl Interface Using Ambient Pressure XPS
Jiangdong Yu1, Conor Byrne2,3, Jameel Imran1
1London Centre for Nanotechnology and Chemistry Department, University College London, 20 Gordon Street, London WC1H 0AJ, U.K.
Abstract:
Ambient pressure X-ray photoelectron spectroscopy (AP-XPS) was employed to investigate the effect of applied potential on the interface of TiO2(110) with 0.1 M HCl. The study, which involved operando electrochemical characterization, enabled real-time monitoring and analysis of electrochemical processes. There is a significant influence on the interface composition; in particular, the surface Cl- surface coverage varies with electrochemical potential. Moreover, there appears to be a reaction of evolved Cl with adventitious carbon to form C-Cl and C-Cl2 species.
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