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Updated: Jun 2, 2025

A Fabrication and Measurement Method for a Flexible Ferroelectric Element Based on Van Der Waals Heteroepitaxy
Published on: April 8, 2018
Nonvolatile Memory Device Based on the Ferroelectric Metal/Ferroelectric Semiconductor Junction
Yan Li1, Yulin Yang1, Hanzhang Zhao1
1Center for Spintronics and Quantum Systems, State Key Laboratory for Mechanical Behavior of Materials, School of Materials Science and Engineering, Xi'an Jiaotong University, Xi'an, Shaanxi 710049, China.
Abstract:
The ferroelectric tunnel junction (FTJ) is a competitive candidate for post-Moore nonvolatile memories due to its low power consumption and nonvolatility, with its performance being strongly dependent on the conditions for contact between the ferroelectric material and the metal electrode. The development of two-dimensional materials in recent years has offered new opportunities such as functional metal layers, which is challenging for traditional FTJ systems. Here, we introduce the newly discovered ferroelectric metal WTe2 as the electrode to construct WTe2/α-In2Se3/Au ferroelectric semiconductor junctions. The interplay between the ferroelectricity in the van der Waals electrode and tunnel junction leads to the emergence of novel device characteristics, including concomitant multiresistance levels, a low switching voltage (<2 V), and a high on/off ratio (>105). Using ferroelectric metal as the electrode for the ferroelectric tunnel/semiconductor junction offers an alternative approach to low-power and high-density ferroelectric memory devices.
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