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    This study presents practical anti-reflection coatings (ARCs) for all-semiconductor metasurfaces, significantly reducing light reflection. Optimized bilayer ARCs achieve near-complete suppression, crucial for advanced optical applications.

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    Area of Science:

    • Optics and Photonics
    • Materials Science
    • Nanotechnology

    Background:

    • Metasurface optical elements are crucial for advanced applications.
    • Light reflection from metasurfaces causes noise, hindering performance in imaging and optical communications.
    • Developing effective anti-reflection strategies is essential for practical metasurface deployment.

    Purpose of the Study:

    • To explore and present practical anti-reflection coatings (ARCs) for all-semiconductor transmissive metasurfaces.
    • To investigate methods for suppressing light reflection across entire metasurfaces.
    • To provide design guidelines for ARCs in metasurface optical elements.

    Main Methods:

    • Numerical investigations of various anti-reflection coatings (ARCs) for metasurfaces.
    • Analysis of monolayer ARCs, considering in-plane structural parameters of meta-atoms (posts or holes).
    • Development and application of intuitive models to represent anti-reflection conditions.
    • Investigation of bilayer ARCs inspired by traditional refractive optics.

    Main Results:

    • Anti-reflection conditions for monolayer ARCs depend on meta-atom structure and ARC plane.
    • Optimized bilayer ARCs achieve significant reflection suppression, down to approximately 0.5%.
    • Nearly non-reflective metasurfaces are achievable by applying bilayer ARCs to the entire pattern.
    • The performance of optimized bilayer ARCs is comparable to traditional anti-reflection coatings.

    Conclusions:

    • Practical ARCs can be designed for all-semiconductor metasurfaces to minimize light reflection.
    • Bilayer ARCs offer a highly effective solution for achieving ultra-low reflection metasurfaces.
    • The proposed methods and materials are compatible with common manufacturing processes, facilitating practical implementation.