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Research on the DF-TSOM method for detecting subsurface defects of optical components
Optics Express
|January 29, 2025
Summary
A new dark field through-focus scanning optical microscopy (DF-TSOM) technique effectively detects 100-nanometer scale subsurface defects. This advanced method significantly improves contrast and sensitivity for transparent materials.
Area of Science:
- Materials Science
- Optical Physics
- Metrology
Background:
- Detecting nanoscale subsurface defects is crucial for material integrity.
- Traditional optical microscopy methods struggle with sub-micrometer defect detection.
Purpose of the Study:
- Introduce a novel dark field through-focus scanning optical microscopy (DF-TSOM) technique.
- Enable detection of hundred-nanometer scale subsurface defects.
Main Methods:
- Experimental validation using prepared subsurface defect samples (1 µm to 0.1 µm diameters).
- Comparison of DF-TSOM performance against traditional through-focus scanning optical microscopy (TSOM).
Main Results:
- DF-TSOM successfully detected subsurface defects as small as 0.1 µm in diameter.
- Traditional TSOM failed to accurately detect defects smaller than 0.4 µm.
- DF-TSOM demonstrated a tenfold improvement in contrast for 1 µm defects compared to TSOM.
Conclusions:
- DF-TSOM offers a highly sensitive and contrast-enhanced approach for subsurface defect detection.
- The technique simplifies hardware setup and shows potential for online monitoring.
- This method advances the capability for nanoscale defect inspection in transparent materials.

