Optimizing laser-induced deep etching technique for micromachining of NXT glass

Area of Science:

• Materials Science
• Optoelectronics
• Manufacturing Engineering

Background:

• Advanced display technologies rely on complex glass materials like Corning's Lotus NXT glass.
• Lotus NXT glass possesses desirable optical, thermal, and dimensional properties for displays.
• Conventional machining methods are inadequate for processing these advanced glass materials.

Purpose of the Study:

• To investigate the feasibility of laser-induced deep etching (LIDE) for micro-hole fabrication in Corning Lotus NXT glass.
• To optimize LIDE parameters for enhanced etching speed and aspect ratio.
• To establish effective processing conditions for advanced display glass.

Main Methods:

• Utilized the laser-induced deep etching (LIDE) technique.
• Systematically varied and optimized laser parameters (wavelength, pulse energy, pulse count, repetition rate).
• Investigated chemical etchant composition (HF:HCl molar ratio) and mechanical parameters.

Main Results:

• Achieved successful micro-hole fabrication in Lotus NXT glass using LIDE.
• Optimized laser parameters: 1030 nm wavelength, 45 µJ pulse energy, 2×10⁴ pulse count, 40 kHz repetition rate.
• Identified an optimal chemical etchant ratio of 1:5 (HF:HCl), yielding a high aspect ratio of ~23:1 and an etching speed of 1200 µm/h.

Conclusions:

• LIDE is a viable and effective method for micro-machining Corning Lotus NXT glass.
• Parameter optimization significantly enhances etching efficiency and achievable aspect ratios.
• The developed LIDE process offers a promising solution for fabricating microstructures in advanced display glass materials.