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Simulating temporal speckle with prescribed correlation properties in optical lithography.

Tomohiro Shirai, Masaki Arakawa, Yousuke Fujimaki

Journal of the Optical Society of America. A, Optics, Image Science, and Vision

|January 31, 2025

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This study introduces a novel method for simulating temporal speckle in optical lithography. The technique uses shot noise to generate optical fields, enabling intuitive understanding and educational use for temporal speckle phenomena.

Area of Science:

Optics and Photonics
Semiconductor Manufacturing

Background:

Temporal speckle is a significant challenge in optical lithography, affecting process precision.
Understanding and simulating temporal speckle is crucial for advancing lithography techniques.

Purpose of the Study:

To develop an intuitive and educational method for simulating temporal speckle patterns.
To provide a tool for analyzing the behavior of temporal speckle under various conditions.

Main Methods:

Numerical generation of optical fields with controlled temporal coherence properties via a shot noise process.
Construction of virtual temporal speckle patterns by arranging instantaneous intensity data.
Examination of temporal speckle contrast variation with detector exposure time.

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Main Results:

Successfully simulated temporal speckle patterns with prescribed coherence properties.
Demonstrated the ability to analyze speckle contrast as a function of exposure time.
Validated the method's utility as an educational tool.

Conclusions:

The proposed simulation method offers an intuitive approach to understanding temporal speckle.
This technique can serve as a valuable educational resource for optics professionals and students.
Facilitates further research into mitigating temporal speckle effects in optical lithography.