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Updated: May 27, 2025

A Fabrication and Measurement Method for a Flexible Ferroelectric Element Based on Van Der Waals Heteroepitaxy
Published on: April 8, 2018
Nonvolatile and Volatile Memory Fusion of Antiferroelectric-like Hafnium-Zirconium Oxide for Multi-Bit Access and
Cheng-Hong Liu1, Kuo-Yu Hsiang1,2, Zhi-Xian Li3
1Program for Semiconductor Devices, Materials, and Hetero-integration, Graduate School of Advanced Technology, National Taiwan University, Taipei 106319, Taiwan.
Abstract:
The fusion of volatile and nonvolatile memory within a complementary-dynamic random-access memory (C-DRAM) in one cell is proposed with antiferroelectric-like hafnium-zirconium oxide with dual function characteristics of DRAM and storage class memory in the memory hierarchy. Atomic-resolution spherical aberration-corrected scanning transmission electron microscopy is employed to directly reveal the insights of phase evolution by utilizing diffractograms to determine lattice parameters. Storage-data-transfer-cycling-recovery with an alternating access scheme is introduced due to the characteristic of independent domains to exhibit multilevel states. Remanent polarization (Pr) can be restored, and 34 periods (3 × 1010 cycles/period) to accumulate 1.02 × 1012 switching cycles are demonstrated. The proposed method is effective in prolonging the endurance and evaluating the spatially resolved evolution of polarization.
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