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Controlling the wavefront aberration of a large-aperture and high-precision holographic diffraction grating
Wenhao Li1, Xinyu Wang2,3, Bayanheshig4
1Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences, 130033, Changchun, Jilin, China. liwh@ciomp.ac.cn.
Light, Science & Applications
|March 5, 2025
Summary
This study introduces a novel technique for fabricating large, high-precision holographic diffraction gratings. The method enhances stage displacement measurement and real-time phase error compensation for improved grating quality.
Area of Science:
- Optics and Photonics
- Metrology
- Nanofabrication
Background:
- Fabricating meter-level holographic diffraction gratings with nano-level precision presents challenges in stage displacement measurement, interference fringe control, and phase error compensation.
- Grating groove errors significantly impact wavefront aberration, necessitating advanced fabrication techniques.
Purpose of the Study:
- To develop and validate a novel technique for fabricating meter-level size and nano-level precision holographic gratings.
- To address key challenges in large-aperture grating fabrication, including high-precision displacement measurement, interference fringe control, and real-time phase error compensation.
Main Methods:
- An integrated displacement measurement combining grating sensing and laser interferometry was developed to enhance precision over long displacement ranges.
- A new interference fringe measurement method utilizing diffraction characteristics and phase-shifting algorithms was implemented for high-quality fringe control.
- A dynamic phase-locking model with heterodyne interferometry was established for real-time compensation of grating phase errors.
Main Results:
- A holographic grating with dimensions of 1500 mm × 420 mm was successfully fabricated.
- The fabricated grating exhibited a wavefront aberration of 0.327λ at 632.8 nm and a wavefront gradient of 16.444 nm/cm.
- The proposed techniques effectively suppressed environmental influences and compensated for stage motion errors.
Conclusions:
- The developed scanning interference field exposure technique enables the fabrication of meter-level, nano-precision holographic gratings.
- This advancement is crucial for applications in chirped pulse amplification systems, high-energy lasers, and ultra-high precision displacement measurements.
- The research offers a significant step forward in large-scale, high-precision optical component manufacturing.
