Atomic layer deposition paves the way for next-generation smart and functional textiles

Area of Science:

• Materials Science
• Textile Engineering
• Nanotechnology

Background:

• Functional textiles offer enhanced properties beyond comfort and aesthetics.
• Existing functional textiles often sacrifice comfort for performance.
• Atomic layer deposition (ALD) presents a novel approach for textile functionalization.

Purpose of the Study:

• To review the application of ALD in creating advanced functional textiles.
• To discuss the mechanism and advantages of ALD for textile coatings.
• To explore the potential and challenges of ALD for large-scale multifunctional fabric production.

Main Methods:

• Review of ALD reaction mechanisms and deposition techniques on fibers and textiles.
• Analysis of research progress in ALD-derived inorganic nanofilms for textiles.
• Discussion of factors influencing ALD processes and commonly used technologies.

Main Results:

• ALD enables precise, conformal nanofilm coatings on textiles.
• ALD-coated textiles exhibit diverse functionalities including antimicrobial, UV resistance, and thermal insulation.
• ALD offers a pathway to multi-functional textiles with preserved comfort.

Conclusions:

• ALD is a promising technology for developing next-generation advanced functional textiles.
• Further research is needed to address challenges for large-scale ALD production of multifunctional fabrics.
• ALD technology can significantly advance the fields of fashion, sustainability, and technical textiles.