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Ultrathin Si-PD design with enhanced guided-mode resonance through slanted surface-relief gratings
Optics Letters
|April 1, 2025
Summary
We developed a novel silicon photodetector (PD) using a slanted grating to enhance near-infrared (NIR) light sensitivity. This design improves absorption in thin layers for faster, more sensitive PDs.
Area of Science:
- Optoelectronics
- Materials Science
- Nanotechnology
Background:
- Photodetectors (PDs) often struggle with low sensitivity to near-infrared (NIR) light.
- There's a critical trade-off between absorption layer thickness and high-speed response in PDs.
Purpose of the Study:
- To introduce a new surface-illuminated silicon photodetector (PD) structure.
- To overcome limitations in NIR sensitivity and the thickness-speed trade-off in PDs.
Main Methods:
- Proposed a novel structure featuring a slanted surface-relief grating composed of tilted silicon (Si) and silicon dioxide (SiO2) arrays.
- Utilized a circular resonator shape in the absorption layer to support lateral quasi-propagating modes.
- Employed simulations to validate the design's performance.
Main Results:
- The slanted grating efficiently deflects normally incident photons.
- The design extends photon lifetime, significantly increasing NIR photon absorption.
- Achieved 29.2% absorption at 1012 nm with an ultra-thin 300 nm absorption layer.
Conclusions:
- The innovative PD design enhances NIR light absorption in thin layers.
- This structure offers a pathway to developing thin and high-speed photodetectors.
- The proposed design addresses key challenges in current photodetector technology.

