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Updated: May 14, 2025

Single-Digit Nanometer Electron-Beam Lithography with an Aberration-Corrected Scanning Transmission Electron Microscope
Published on: September 14, 2018
Desheng Ma1, Steven E Zeltmann2, Chenyu Zhang1
1School of Applied and Engineering Physics, Cornell University, Ithaca, NY 14853, USA.
We developed a Bayesian approach to automate aberration correction in Scanning Transmission Electron Microscopy (STEM). This method uses beam emittance and a deep neural network for faster, more accurate atomic-scale material analysis.
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