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Ultrathin Bi2OSe/Si Heterojunction Photodetector with Tunneling Oxide Passivation for Enhanced Optoelectronic
Tzu-Pu Hung1, Wei-Han Chen1, Yi-Jyun Chen1
1Department of Materials Science and Engineering, National Tsing Hua University, Hsinchu 300044, Taiwan.
Abstract:
Two-dimensional (2D) materials have garnered significant attention for next-generation optoelectronic devices due to their exceptional physical properties. This study introduces a high-performance ultrathin Bi2O2Se/Si heterojunction photodetector with tunneling oxide passivation, fabricated using a transfer-free pulsed laser deposition method. The Bi2O2Se layer exhibits strong air stability and compatibility for practical applications. By incorporating a thin SiO2 tunneling layer, the heterostructure achieves a low dark current (∼22.3 nA/cm2), a high on/off ratio (∼8 × 106), and a responsivity of 23.0 A/W. Compared to traditional CdS/Si devices, this photodetector demonstrates superior performance, including faster response time and higher stability. These findings underscore the potential of Bi2O2Se/Si heterostructures for advanced photonic and optoelectronic applications.
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