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Updated: May 5, 2026

Plasma-assisted Molecular Beam Epitaxy of N-polar InAlN-barrier High-electron-mobility Transistors
Published on: November 24, 2016
Experimental determination of giant polarization in wurtzite III-nitride semiconductors
Haotian Ye1, Ping Wang2, Rui Wang1
1State Key Laboratory for Mesoscopic Physics and Frontiers Science Center for Nano-Optoelectronics, School of Physics, Peking University, 100871, Beijing, China.
Abstract:
Polarization engineering has revolutionized the photonic and electronic landscape of III-nitride semiconductors over the past decades. However, recent revelations of giant ferroelectric polarization in wurtzite III-nitrides challenge the long-standing paradigms. Here, we experimentally elucidate the polarization, including its magnitude and orientation, and its relationship to lattice polarity in III-nitrides. Those experimentally determined polarizations exceeding 1 C/m2 with an upward orientation in metal-polar wurtzite nitride compounds align with recent theoretical predictions. To reconcile these findings, a unified polarization framework is established based on the centrosymmetric layered-hexagonal reference structure. This unified framework redefines the polarization landscape in contemporary GaN heterostructures, quantum structures, and ferroelectric heterostructures. Furthermore, we predict significant tunability and a dramatic increase in sheet carrier concentration in ferroelectric ScAlN/GaN heterostructures, heralding advancements in high-power, high-frequency, and reconfigurable transistors, and non-volatile memories. This work bridges the critical gap in the understanding of polarization in both conventional and ferroelectric wurtzite nitrides, offering fundamental insights and paving the way for next-generation photonic, electronic, and acoustic devices.
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