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Updated: May 15, 2025

A Standard and Reliable Method to Fabricate Two-Dimensional Nanoelectronics
Published on: August 28, 2018
Threshold Voltage Control through Solvent Doping of Monolayer MoS2 Transistors
Kathryn Neilson1,2, Charles Mokhtarzadeh1, Marc Jaikissoon1
1Technology Research, Intel Corporation, Hillsboro, Oregon 97124, United States.
Abstract:
Two-dimensional (2D) materials are promising for beyond-silicon logic due to their ultrathin bodies for atomically thin channels. A key challenge lies in doping, to enable high-performance devices with a predictable and tunable threshold voltage (VT), while retaining switching behavior. In this work, we explore n-doping monolayer MoS2 with solvents of varying polarity to both enhance transistor performance and understand how solvents impact the VT. We find that solvent polarity predictably shifts the VT when states are available near the MoS2 conduction band. This n-doping shifts the VT, increases the maximum on-current, and is achieved without significant degradation in the subthreshold swing. We also find that solvent doping reduces the Schottky barrier width, enabling a two-fold reduction in contact resistance. These findings provide a method to tune carrier concentrations by VT shifting and offer clarity on the role solvents play in processing 2D devices.
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