Electron irradiation-based cleaning of the scanning electron microscope and its samples

Area of Science:

• Materials Science
• Surface Science
• Microscopy

Background:

• Carbonaceous material deposition under electron beams is a persistent issue in scanning electron microscopy (SEM).
• This contamination hinders high-resolution imaging and precise measurements, particularly at the nanoscale.
• Existing methods like plasma cleaning operate in low vacuum, which may not be suitable for all applications.

Purpose of the Study:

• To introduce and evaluate a novel cleaning device for SEM contamination.
• To assess the effectiveness of low-energy electron irradiation in high and ultra-high vacuum (UHV) for contamination removal.
• To provide an alternative to plasma-based cleaning methods for SEM applications.

Main Methods:

• The study investigates a new cleaning device based on low-energy electron irradiation.
• The device operates in high and ultra-high vacuum (UHV) environments.
• Performance is assessed by observing its ability to prevent carbonaceous deposition during SEM operation.

Main Results:

• The new device effectively reduces carbonaceous contamination to non-perceptible levels.
• Continuous imaging and measurements can be performed for extended periods without significant deposition.
• The method is shown to be effective in high and UHV conditions, unlike plasma cleaners.

Conclusions:

• Low-energy electron irradiation in high/UHV is a viable and effective method for SEM contamination control.
• This new approach offers advantages over traditional plasma cleaning, especially for high-vacuum applications.
• The technology enables artifact-free, high-resolution nanoscale imaging and measurements in SEM.