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Updated: Sep 19, 2025

In Situ Transmission Electron Microscopy with Biasing and Fabrication of Asymmetric Crossbars Based on Mixed-Phased a-VOx
Published on: May 13, 2020
1State Key Laboratory for Silicon and Advanced Semiconductor Materials, School of Materials Science and Engineering, Zhejiang University, Hangzhou, Zhejiang 310027, PR China; Jihua Laboratory, Foshan, Guangdong 528200, PR China.
A new self-aligned protective shield method protects beam-sensitive nanostructures during focused ion beam (FIB) preparation for transmission electron microscopy (TEM). This technique prevents ion beam damage, ensuring high-quality specimens for micro-electro-mechanical systems (MEMS) devices.
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