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Photosystem II01:22

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The multi-protein complex photosystem II (PS II) harvests photons and transfers their energy through its bound pigments to its reaction center, and ultimately to photosystem I (PSI) through the electron transport chain. The pigments responsible for caputirng the light energy in photosystems include chlorophyll a, chlorophyll b, and carotenoids.
The pigment molecules are arranged across  two photosystem domains — the antenna complex and the reaction center. The main aim of the pigment...
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Enhancing 365 nm Photoresist Performance Using 2-Isopropylthioxanthone as a Photosensitizer.

Litao Zhou1,2, Zhaoxian Tang1, Haoyuan Li1

  • 1School of Microelectronics, Shanghai University, Shanghai 201800, China.

ACS Applied Materials & Interfaces
|June 24, 2025
PubMed
Summary

Adding 2-isopropylthioxanthone (2-ITX) as a photosensitizer significantly boosts the sensitivity of i-line photoresists. This enhancement is crucial for advanced lithography applications requiring high-performance chemical amplification resists.

Keywords:
chemically amplified photoresisthigh sensitivitynonionic photoacid generatorphotosensitizertriplet−triplet energy transfer

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Area of Science:

  • Materials Science
  • Organic Chemistry
  • Photochemistry

Background:

  • Chemical amplification resists (CARs) are vital for advanced lithography.
  • Nonionic photoacid generators (PAGs) in CARs often exhibit low sensitivity.
  • Improving PAG sensitivity is critical for next-generation lithographic processes.

Purpose of the Study:

  • To investigate the efficacy of 2-isopropylthioxanthone (2-ITX) as a photosensitizer for i-line (365 nm) photoresist systems.
  • To synthesize and evaluate novel PAGs (TFPSO, BrTFPSO, TFPVSO, BrTFPVSO) in conjunction with 2-ITX.
  • To compare PAG-blended and PAG-bound photoresist systems for lithographic performance.

Main Methods:

  • Synthesis of four novel PAGs: TFPSO, BrTFPSO, TFPVSO, and BrTFPVSO.
  • Formulation of PAG-blended and PAG-bound photoresists using EAMA and GBLMA copolymers.
  • Evaluation of photoresist sensitivity, contrast, and acid diffusion with varying 2-ITX concentrations (10-20 wt %).
  • Characterization using UV-vis and 1H NMR spectroscopy.

Main Results:

  • The PAG-blended system with 10 wt % 2-ITX achieved a low dose-to-clear (E0) of 38.4 mJ/cm2 and high contrast (γ = 18.5).
  • Elevated postexposure bake temperatures (110 °C) further reduced E0 to 5.6 mJ/cm2.
  • PAG-bound systems showed reduced acid diffusion (<1% pattern error) but lower sensitivity (E0 = 150.9-673.7 mJ/cm2).
  • Spectroscopic analysis confirmed 2-ITX acts as an energy transfer agent without direct photolytic involvement.

Conclusions:

  • 2-isopropylthioxanthone (2-ITX) effectively enhances the sensitivity of i-line photoresists by facilitating energy transfer to PAGs.
  • The PAG-blended approach with 2-ITX offers superior sensitivity and contrast for advanced lithography.
  • Incorporating photosensitizers like 2-ITX significantly broadens the application scope of photoresist technologies.