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Updated: Sep 17, 2025

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Supercritical Nitrogen Processing for the Purification of Reactive Porous Materials
Published on: May 15, 2015
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Low temperature atomic layer deposition of boron nitride using the in situ decomposition of ammonium carbamate
Ana Álvarez-Yenes1,2, Victor O Koroteev1, Maxim R Ryzhikov3
1CIC nanoGUNE BRTA, 20018 Donostia-San Sebastián, Basque Country, Spain. an.alvarez@nanogune.eu.
Abstract:
Here, we report on a new atomic layer deposition (ALD) process for the growth of amorphous boron nitride thin films at low temperatures (100-275 °C) using carbamic acid, a highly reactive intermediate species found in the decomposition of ammonium carbamate, as the nitrogen source.
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