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Jeff J P M Schulpen1, Saravana B Basuvalingam1, Marcel A Verheijen1,2

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Achieving conformal 2D transition metal dichalcogenide (TMD) films on 3D nanostructures requires bending basal planes. A minimum 4 nm radius of curvature is identified for conformal deposition of tungsten disulfide (WS2) films.

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Area of Science:

  • Materials Science
  • Nanotechnology
  • Surface Science

Background:

  • Two-dimensional transition metal dichalcogenides (2D TMDs) are crucial for advanced applications like nanoelectronics and catalysis.
  • Conformal deposition of 2D TMDs onto 3D nanostructures presents challenges due to the need for bending their basal planes.

Purpose of the Study:

  • To investigate the limits of conformal deposition of 2D tungsten disulfide (WS2) films on 3D silicon dioxide (SiO2) nanostructures.
  • To determine the critical radius of curvature for achieving conformal WS2 film deposition.

Main Methods:

  • Utilizing atomic layer deposition (ALD) for WS2 film deposition on SiO2 3D nanostructures.
  • Employing cross-sectional transmission electron microscopy (TEM) for high-resolution imaging and analysis of film conformality.

Main Results:

  • A minimum radius of curvature of 4 nm was identified as a threshold for near-complete basal plane conformality.
  • Conformality was consistently observed for radii above 4 nm, while it occurred in only about half of the cases for smaller radii.
  • The tipping point correlates with the balance between adhesion and stiffness forces.

Conclusions:

  • The findings provide critical insights into the mechanical limitations of conformal 2D material deposition on curved surfaces.
  • The established critical radius of curvature can guide the design of 3D nanostructured devices and substrates for optimal 2D material integration.
  • This research offers practical guidelines for fabricating devices requiring conformal 2D TMD films.