Field Effect Transistor
Biasing of Metal-Semiconductor Junctions
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Comprehensive Characterization of Extended Defects in Semiconductor Materials by a Scanning Electron Microscope
Published on: May 28, 2016
Xiaohan Zai1,2, He Dong1, Zihong Shen1
1State Key Laboratory of Flexible Electronics (LOFE) & Institute of Flexible Electronics (IFE), MIIT Key Laboratory of Flexible Electronics (KLoFE), Shaanxi Key Laboratory of Flexible Electronics, Northwestern Polytechnical University, 127 West Youyi Road, Xi'an, 710072, China.
Tin-based perovskite field-effect transistors (FETs) face challenges from defects impacting performance. This review details defect origins, passivation strategies, and future directions for high-performance Sn-based perovskite FETs.
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