Albedo parameter-based characterization of surface roughness in chemically etched zirconium samples

Area of Science:

• Materials Science
• Nuclear Physics
• Surface Engineering

Background:

• Surface roughness is a critical parameter influencing material performance and behavior.
• Traditional surface characterization methods often require physical contact, limiting their application in certain environments.
• Zirconium alloys are used in various demanding applications, necessitating precise surface control.

Purpose of the Study:

• To investigate gamma-ray albedo parameters as a non-contact method for characterizing surface roughness.
• To correlate albedo parameters with established profilometric measurements of etched zirconium foils.
• To assess the sensitivity of gamma-ray scattering to surface topography variations.

Main Methods:

• Zirconium foils were chemically etched using hydrofluoric acid for varying durations.
• Surface morphology was quantified using profilometry (Ra, Rq, Rp, Rv, Rt).
• Gamma-ray albedo parameters were determined by measuring Compton and coherent scattering of 59.54 keV photons from an Am-241 source.

Main Results:

• A strong positive correlation was observed between etching time and surface roughness.
• Albedo parameters increased with increasing surface roughness.
• Photon scattering intensity proved sensitive to the surface topography of the zirconium foils.

Conclusions:

• Gamma-ray albedo parameters can effectively serve as an indirect probe for surface roughness.
• This radiation-based technique is suitable for non-contact surface characterization, especially in challenging environments.
• Potential applications include nuclear materials diagnostics, surface treatment monitoring, and biomedical implant evaluation.