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Improving third harmonic generation performance by elevating the operation temperature of KDP and DKDP crystals.
Optics Express
|August 13, 2025
Summary
Elevating the operating temperature of Potassium dihydrogen phosphate (KH₂PO₄, KDP) crystals significantly enhances their performance in inertial confinement fusion (ICF) systems. This method boosts UV generation efficiency and laser-induced damage threshold (LIDT).
Area of Science:
- Nonlinear optics
- Laser science and technology
- Materials science
Background:
- Potassium dihydrogen phosphate (KH₂PO₄, KDP) family crystals are essential nonlinear optical materials for inertial confinement fusion (ICF) laser drivers.
- Third harmonic generation (THG) using KDP and DKDP crystals is a critical UV generation scheme in ICF.
- Improving output energy, conversion efficiency, and anti-damage ability of these crystals is a key research focus.
Purpose of the Study:
- To investigate the effect of elevated operating temperatures on the THG performance of KDP and DKDP crystals.
- To determine if increasing crystal temperature can enhance UV frequency conversion efficiency and laser-induced damage threshold (LIDT).
Main Methods:
- Experimental analysis of THG performance of KDP and DKDP crystals at elevated temperatures (up to 130 °C).
- Variable-temperature Z-scan tests to probe optical properties.
- Measurement of THG energy, conversion efficiency, and LIDT.
Main Results:
- At 130 °C, THG energy increased by 11.9%-16.5% for KDP and 4.2%-7.6% for DKDP.
- Conversion efficiency increased by 5.3%-5.4% for KDP and 4.2%-6.6% for DKDP.
- LIDT increased by 17.1%-24.5% for KDP and 14.2%-26.5% for DKDP.
- Variable-temperature Z-scan tests showed suppressed two-photon absorption at higher temperatures.
Conclusions:
- Substantially elevating the operating temperature of KDP and DKDP crystals is an effective strategy to improve THG performance.
- Higher temperatures suppress two-photon absorption, leading to enhanced UV frequency conversion and increased LIDT.
- This research provides a valuable technique for developing advanced UV and deep-UV lasers for ICF facilities.

