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Area of Science:

  • Optics and Photonics
  • Materials Science
  • Semiconductor Manufacturing

Background:

  • Advancements in computer chip manufacturing require enhanced extreme-ultraviolet (XUV) light sources.
  • Observing novel material properties, such as magnetism, necessitates tunable polarization in XUV sources.
  • Current XUV sources lack the accessibility and polarization control needed for advanced material characterization.

Purpose of the Study:

  • To present a compact, tabletop XUV source for polarization-sensitive imaging.
  • To enable the study of dichroic properties in novel technology materials.
  • To demonstrate the capability of generating tunable polarized XUV light for high-resolution imaging.

Main Methods:

  • Development of a compact XUV tabletop source utilizing high harmonic generation (HHG).
  • Implementation of the MAch-ZEhnder-Less for Threefold Optical Virginia spiderwort apparatus for generating circularly polarized harmonics.
  • Optimization of linearly polarized 42 eV and 52 eV beams and application of ptychography for imaging.

Main Results:

  • Achieved optimized average powers of 19.4 nW for the 42 eV beam and 8.0 nW for the 52 eV beam.
  • Demonstrated the generation of circularly polarized harmonics.
  • Successfully imaged a Siemens star test target with 160 nm resolution using the 42 eV linearly polarized beam.

Conclusions:

  • The developed compact XUV source is suitable for polarization-sensitive imaging applications.
  • The HHG-based source provides tunable polarization, crucial for material property analysis.
  • The demonstrated resolution of 160 nm highlights the potential for advanced semiconductor metrology.