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FEA-based optimal design of special suction cups temperature-controlled coatings
Diqing Fan1, Jianyu Liu1, Shuo Zhang1
1School of Mechanical and Automotive Engineering, Shanghai University of Engineering Science, Shanghai, China.
Science Progress
|September 8, 2025
Summary
A new electrostatic chuck system uses thermal control coatings for precise wafer processing temperature uniformity. This zoned design achieves exceptional temperature stability, crucial for advanced semiconductor manufacturing.
Area of Science:
- Materials Science
- Semiconductor Manufacturing
- Thermal Engineering
Background:
- Growing demand for precise temperature control in wafer processing.
- Need for enhanced thermal management robustness and homogeneity in semiconductor fabrication.
Purpose of the Study:
- Propose a specialized electrostatic chuck temperature control system using thermal control coatings.
- Optimize thermal management for improved temperature precision and uniformity.
Main Methods:
- Employed a zoned control methodology with metal-oxide conductive coatings on silicon carbide heating plates.
- Established a quadrant-based thermal control coating model.
- Utilized finite element analysis (FEA) for geometric configuration comparison and system optimization.
Main Results:
- Identified the zoned structure as the optimal configuration among sectorial, spiral, and zoned designs.
- Achieved maximum temperature difference control below 0.2°C.
- Stabilized surface temperature uniformity at approximately 0.05°C through precise coating current regulation.
Conclusions:
- The proposed electrostatic chuck system effectively enhances thermal management robustness and homogeneity.
- Demonstrated the efficacy of the zoned control methodology for high-precision temperature regulation.
- Established a theoretical foundation for advanced semiconductor thermal management systems.

