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Nitrogen Vacancies Induce Fatigue in Ferroelectric Al0.93B0.07N.
Walter J Smith1, Betul Akkopru-Akgun2, Erdem Ozdemir2
1School of Mechanical Engineering and Birck Nanotechnology Center, Purdue University, West Lafayette, Indiana 47907, United States.
Ferroelectric aluminum boron nitride (Al0.93B0.07N) memory devices suffer from limited endurance. Ferroelectric switching creates nitrogen vacancies, likely due to hot-atom damage, which degrades device performance.
Area of Science:
- Materials Science
- Solid State Physics
- Device Physics
Background:
- Wurtzite ferroelectrics like Al0.93B0.07N offer potential for high-temperature memory applications due to large remanent polarization and stability.
- Current Al0.93B0.07N devices exhibit insufficient endurance lifetimes for next-generation computing architectures.
Purpose of the Study:
- To identify the specific defects limiting the endurance of Al0.93B0.07N ferroelectric devices.
- To understand the defect evolution mechanisms during ferroelectric switching cycles.
Main Methods:
- Combined electronic measurements and optical spectroscopies to characterize defect states.
- Photoluminescence spectroscopy and positive-up negative-down (PUND) measurements to quantify polarization and defect transitions.
- Thermally stimulated depolarization current and modulus spectroscopy to further analyze defect behavior.
Main Results:
- Identified an emerging optical transition near 2.1 eV during ferroelectric switching, correlating with nonswitching polarization.
- Observed strengthening of this 2.1 eV transition with cycling, indicating an increase in defect states.
- Ascribed the 2.1 eV transition to nitrogen vacancies interacting with deeper bandgap defects.
Conclusions:
- Ferroelectric switching in Al0.93B0.07N generates nitrogen vacancies, likely via hot-atom damage from high switching fields.
- This defect generation mechanism is the primary cause of limited endurance in these ferroelectric memory devices.
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