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Photoassisted Chemical Vapor Deposition Using (η4-Diene)Ru(CO)3 Precursors

Christopher R Brewer1, Bishwaprava Das2, Rashmi Singh2

  • 1Department of Materials Science and Engineering, University of Texas at Dallas, Richardson, Texas 75080, United States.

ACS Applied Materials & Interfaces
|September 16, 2025
PubMed

Keywords:
mechanism-based precursor designphotoassisted chemical vapor depositionphotolysisquantum yieldrutheniumself-assembled monolayers

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