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Dry resist lamination for wafer-scale fabrication of microfluidic superfusion devices
Rui Liu1, Esteban Pedrueza-Villalmanzo1, Aldo Jesorka2
1Department of Chemistry and Chemical Engineering, Chalmers University of Technology, 412 96, Göteborg, Sweden.
Scientific Reports
|September 25, 2025
Abstract:
We present a cleanroom fabrication process of free-standing open space microfluidic devices with channel widths of ~ 30 µm on the wafer scale by means of photolithography in combination with lamination technology.
