Interference Field Control for High-Uniformity Nanopatterning: A Review

Interference lithography (IL) offers high throughput, excellent uniformity, and maskless patterning capabilities. Compared to other methods, IL enables large-area, cost-effective fabrication of periodic structures with subwavelength resolution, which is particularly valuable for sensing applications, enabling the development of more sensitive, high-resolution, and reliable sensors. This review provides a comprehensive analysis of IL from the perspective of optical field control. We first introduce the principles of interference field formation and summarize key system architectures, including Mach-Zehnder and Lloyd's mirror configurations, as well as advanced schemes such as multi-beam interference and multi-step exposure for complex pattern generation. We then examine how wavefront engineering, polarization modulation, and phase stabilization influence pattern morphology, contrast, and large-area uniformity. To address dynamic drifts caused by environmental perturbations, both passive vibration isolation and active fringe-locking techniques are discussed. For fringe-locking systems, we review methods for drift monitoring, control algorithms, and feedback implementation. These developments enhance the capability of IL systems to deliver nanoscale accuracy under dynamic conditions, which is essential for stable and high-performance sensing. Looking ahead, IL is evolving into a versatile platform for sensor-oriented nanofabrication. By integrating physical modeling, precision optics, and real-time control, IL provides a robust foundation for advancing next-generation sensing technologies with higher sensitivity, resolution, and reliability.