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Acid Halides to Alcohols: LiAlH4 Reduction01:19

Acid Halides to Alcohols: LiAlH4 Reduction

Acid halides are reduced to alcohols in the presence of a strong reducing agent like lithium aluminum hydride.
The mechanism proceeds in three steps. First, the nucleophilic hydride ion attacks the carbonyl carbon of the acid halide to form a tetrahedral intermediate. Next, the carbonyl group is re-formed, and the halide ion departs as a leaving group, generating an aldehyde. A second nucleophilic attack by the hydride yields an alkoxide ion, which, upon protonation, gives a primary alcohol as...

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Passivation Strategies for Far-Ultraviolet Al Mirrors Using Plasma-Based AlF3 Processing.

Maria Gabriela Sales1, David R Boris2, Luis V Rodriguez de Marcos3

  • 1NRC Research Associateship Program, Washington, DC, 20001, United States.

Chemistry of Materials : a Publication of the American Chemical Society
|September 29, 2025
PubMed
Summary
This summary is machine-generated.

Researchers developed a hybrid plasma-enhanced atomic layer deposition (PEALD) system to create protective fluoride coatings for aluminum mirrors, significantly improving far-ultraviolet (FUV) reflectivity for astrophysical applications.

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Area of Science:

  • Materials Science
  • Optics
  • Plasma Physics

Background:

  • High-purity aluminum exhibits excellent far-ultraviolet (FUV) reflectance, crucial for astrophysical instrumentation.
  • Atmospheric oxidation of aluminum forms native oxide, degrading FUV optical properties.
  • Protective coatings are essential to maintain aluminum's FUV reflectance.

Purpose of the Study:

  • To develop and optimize a hybrid plasma-enhanced atomic layer deposition (PEALD) system for passivating aluminum mirrors.
  • To investigate the use of in situ electron beam (e-beam) plasma for creating metal fluoride films.
  • To establish effective pretreatment methods for subsequent fluoride layer deposition.

Main Methods:

  • A modified atomic layer deposition (ALD) reactor was used, combining inductively coupled plasma (ICP) and e-beam driven plasma sources.
  • The effects of sample grounding, SF6/Ar flow, and temperature on AlF3 film properties were studied.
  • In situ e-beam plasma processing and XeF2 passivation were explored as seed layer pretreatments.

Main Results:

  • Optimal conditions yielded AlF3 coatings with high FUV reflectivity (92% at 121 nm, 42% at 103 nm).
  • The performance of the developed coatings is comparable to state-of-the-art AlF3 passivation layers.
  • Both in situ e-beam plasma and XeF2 passivation proved effective for preparing unoxidized aluminum surfaces.

Conclusions:

  • The hybrid PEALD system offers a viable method for creating high-performance FUV mirror coatings.
  • Optimized in situ e-beam processing provides a promising pathway for depositing various fluoride-based layers (e.g., MgF2, LiF) using ALD/PEALD.
  • This technique enhances the utility of aluminum mirrors in FUV applications, particularly in space-based instrumentation.