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![[DPEPhosbcpCu]PF6: A General and Broadly Applicable Copper-Based Photoredox Catalyst](/_next/image?url=https%3A%2F%2Fcloudfront.jove.com%2FCDNSource%2Fteasers%2F59739.jpg&w=3840&q=50)
[DPEPhosbcpCu]PF6: A General and Broadly Applicable Copper-Based Photoredox Catalyst
Published on: May 21, 2019
Direct generation of nitrogen-centered radicals via non-covalent interaction between Cu complexes and BiVO4
Lei Wu1,2, Kun Dang1,2, Qiaozhen Li1,2
1Key Laboratory of Photochemistry, Beijing National Laboratory for Molecular Sciences, Institute of Chemistry, Chinese Academy of Sciences, Beijing, China.
Abstract:
Semiconductor-based photoelectrochemistry commonly relies on efficient interactions between semiconductor surfaces and adsorbates for promoting charge transfer and efficiently activating inert bonds. But at the repulsive interfaces (e.g., between like-charged substrates and electrodes), such interactions cannot be achieved. Contrary to this paradigm, we find that the van der Waals interaction between a series of N-coordinated Cu complex cations and BiVO4 photoanodes results in a high photovoltage of 0.53 V and charge transfer efficiency of 96%, along with the photocurrent density approaching the theoretical limit of BiVO4. This non-covalent interaction enables the universal generation of nitrogen-centered radicals from directly cleaving native N-H bonds and generates N-N coupling products with a Faradaic efficiency exceeding 96%. Its practical application is further demonstrated in an amplified photoelectrochemical reactor, generating a photocurrent of 409 mA and a yield rate of 6069 μmol h-1 for hydrazine production, which is competitive with most reported N-N coupling methods.
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